Modal focusing effect of positive and negative ions by a three-dimensional plasma-sheath lensSTAMATE, E; SUGAI, H.Physical review letters. 2005, Vol 94, Num 12, pp 125004.1-125004.4, issn 0031-9007Article

On energetic electrons in a multipolar magnetically confined Ar plasmaSTAMATE, E; INAGAKI, K; OHE, K et al.Journal of physics. D, Applied physics (Print). 1999, Vol 32, Num 6, pp 671-674, issn 0022-3727Article

Catalyst-free low-temperature growth of carbon nanofibers by microwave plasma-enhanced CVDMORI, S; SUZUKI, M.Thin solid films. 2009, Vol 517, Num 14, pp 4264-4267, issn 0040-6090, 4 p.Conference Paper

Characteristic study of atmospheric pressure microplasma jets with various operating conditionsKIM, S. J; CHUNG, T. H; BAE, S. H et al.Thin solid films. 2009, Vol 517, Num 14, pp 4251-4254, issn 0040-6090, 4 p.Conference Paper

Comparative study of electro-physical properties of heterostructures containing PECVD nanocrystalline and anodic porous silicon layersVIKULOV, V. A; KOROBTSOV, V. V; DIMITRIEV, A. A et al.Thin solid films. 2009, Vol 517, Num 14, pp 3912-3915, issn 0040-6090, 4 p.Conference Paper

Effect of a ZnO buffer layer on the characteristics of MgZnO thin films grown on Si (100) substrates by radio-frequency magnetron sputteringJIN YOUNG MOON; JUN HO KIM; KIM, Hyunghoon et al.Thin solid films. 2009, Vol 517, Num 14, pp 3931-3934, issn 0040-6090, 4 p.Conference Paper

Effect of yttrium doping on the dielectric properties of CaCu₃Ti₄O₁₂ thin film produced by chemical solution depositionSAJI, Viswanathan S; HAN CHEOL CHOE.Thin solid films. 2009, Vol 517, Num 14, pp 3896-3899, issn 0040-6090, 4 p.Conference Paper

Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl_2/Ar gasDO YOUNG LEE; CHEE WON CHUNG.Thin solid films. 2009, Vol 517, Num 14, pp 4047-4051, issn 0040-6090, 5 p.Conference Paper

Feasibility study of the sterilization of pork and human skin surfaces by atmospheric pressure plasmasSE YOUN MOON; KIM, D. B; GWEON, B et al.Thin solid films. 2009, Vol 517, Num 14, pp 4272-4275, issn 0040-6090, 4 p.Conference Paper

Frequency upconversion fluorescence studies of Er³⁺/Yb³⁺-codoped KNbO₃ phosphorsBALAKRISHNAIAH, R; DONG WOO KIM; SOUNG SOO YI et al.Thin solid films. 2009, Vol 517, Num 14, pp 4138-4142, issn 0040-6090, 5 p.Conference Paper

High efficiency green phosphorescent organic light emitting device with (TCTA/TCTA_0.5TPBi_0.5/TPBi): Ir(ppy)₃ emission layerJANG, J. G; SHIN, H. K.Thin solid films. 2009, Vol 517, Num 14, pp 4122-4126, issn 0040-6090, 5 p.Conference Paper

In-situ blends of polypyrrole/poly(3,4-ethylenedioxythiopene) using vapor phase polymerization techniqueDONG OUK KIM; LEE, Pyoung-Chan; KANG, Soo-Jung et al.Thin solid films. 2009, Vol 517, Num 14, pp 4156-4160, issn 0040-6090, 5 p.Conference Paper

Process optimization of CF₄/Ar plasma etching of Au using I-optimal designTAE YOON KANG; KIM, Gwangbeom; IL HWAN CHO et al.Thin solid films. 2009, Vol 517, Num 14, pp 3919-3922, issn 0040-6090, 4 p.Conference Paper

Realization of high mobility p-type co-doped ZnO: AIN film with a high density of nitrogen-radicalsJONG HYUN LEE; JUN SEOK LEE; SEUNG NAM CHA et al.Thin solid films. 2009, Vol 517, Num 14, pp 3950-3953, issn 0040-6090, 4 p.Conference Paper

Residual stress on nanocrystalline silicon thin films deposited under energetic ion bombardment by using internal ICP-CVDLEE, H. C; HONG, S. P; KANG, S. K et al.Thin solid films. 2009, Vol 517, Num 14, pp 4100-4103, issn 0040-6090, 4 p.Conference Paper

The deposition of amorphous carbon thin films for hard mask applications by reactive particle beam assisted sputtering processLEE, Taehoon; MIN, Nam-Ki; HYUN WOO LEE et al.Thin solid films. 2009, Vol 517, Num 14, pp 3999-4002, issn 0040-6090, 4 p.Conference Paper

Ultraviolet photodetectors made from Sn0₂ nanowiresWU, Jyh-Ming; KUO, Cheng-Hsiang.Thin solid films. 2009, Vol 517, Num 14, pp 3870-3873, issn 0040-6090, 4 p.Conference Paper

Chemical and structural modifications in a 193-nm photoresist after low-k dry etchKESTERS, E; CLAES, M; BIEBUYK, J. J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3454-3459, issn 0040-6090, 6 p.Conference Paper

Effects of various additive gases on chemical dry etching rate enhancement of low-k SiOCH layer in F₂/Ar remote plasmasYUN, Y. B; PARK, S. M; KIM, D. J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3549-3553, issn 0040-6090, 5 p.Conference Paper

Electrochemical properties of TiN coatings on 316L stainless steel separator for polymer electrolyte membrane fuel cellJEON, W.-S; KIM, J.-G; KIM, Y.-J et al.Thin solid films. 2008, Vol 516, Num 11, pp 3669-3672, issn 0040-6090, 4 p.Conference Paper

Fabrication and electrochemical characterization of HRP-lipid Langmuir-Blodgett film and its application as an H₂O₂ biosensorKAFI, A. K. M; LEE, Dong-Yun; CHOI, Won-Suk et al.Thin solid films. 2008, Vol 516, Num 11, pp 3641-3645, issn 0040-6090, 5 p.Conference Paper

Increase of hardness and thermal stability of TiAlN coating by nanoscale multi-layered structurization with a BN phasePARK, Jong-Keuk; BAIK, Young-Joon.Thin solid films. 2008, Vol 516, Num 11, pp 3661-3664, issn 0040-6090, 4 p.Conference Paper

Investigation of particle reduction and its transport mechanism in UHF-ECR dielectric etching systemKOBAYASHI, Hiroyuki; YOKOGAWA, Kenetsu; MAEDA, Kenji et al.Thin solid films. 2008, Vol 516, Num 11, pp 3469-3473, issn 0040-6090, 5 p.Conference Paper

Plasma diagnostics by detecting the ion flux profile to a biased-targetSTAMATE, E; OHE, K; TAKAI, O et al.Surface & coatings technology. 2003, Vol 169-70, pp 65-68, issn 0257-8972, 4 p.Conference Paper

Atmospheric pressure PECVD of SiO₂ thin film at a low temperature using HMDS/O₂/He/ArKIM, Y. S; LEE, J. H; LIM, J. T et al.Thin solid films. 2009, Vol 517, Num 14, pp 4065-4069, issn 0040-6090, 5 p.Conference Paper